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2058 |
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Characteristics of Cu film-like deposited by using VLPPS |
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Nannan Zhang / LERMPS-UTBM,Universite de Technologie de Belfort Montbeliard , FRANCE Marie-Pierre Planche / UTBM-LERMPS, FRANCE Fu Sun/ UTBM-LERMPS, FRANCE Lin Zhu/ UTBM-LERMPS, FRANCE Christophe Verdy/ UTBM-LERMPS, FRANCE Hanlin Liao/ UTBM-LERMPS, FRANCE Christian Coddet/ UTBM-LERMPS, FRANCE |
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Cu coatings were obtained by the VLPPS (Very Low Pressure Plasma Spray) process using a torch F4-vb. The tank pressure is varied from 1 mbar to 10 mbars: these specific conditions can allow obtaining a higher vapor condensation fraction in the coating. Different sizes of powders are used to compare the vaporization situation. The other possible influencing factors are also considered such as the distance between the torch and substrate, the orientation of the vapors and also the substrate temperatures for obtaining compact film-like coating. Microstructures of coatings are studied and analyzed and combined with the results of plasma diagnostics. Jobin-Yvon spectrometer (type TRIAX190, UK) and Plasus Specline Spectroscopy software are both used for detecting and analyzing plasma spectrum data. The value of plasma electronic excited temperature Te was calculated through choosing Há and Hâ two atom spectrums and the results showed that the plasma belongs to cold plasma in the local thermodynamic equilibrium situation in VLPPS. |