Abstract No.:
1005

 Scheduled at:
Poster Presentation
Funktionelle Oberflächen
Functional surfaces


 Title:
Applicability of MSCoating to Titanium Aluminide Substrate ?a New Coating and Cladding Technology Using Electro-Discharge Energy?

 Authors:
Takayuki Kamimura* / Tokyo Institute of Technology, Japan
Akio Suzumura / Tokyo Institute of Technology, Japan
Hiroyuki Odhiai/ Ishikawajima-Harima Heavy Industries, Japan
Takayuki Kamimura/ Tokyo Institute of Technology, Japan
Mitsutoshi Watanabe/ Ishikawajima-Harima Heavy Industries, Japan
Takahisa Yamazaki/ Tokyo Institute of Technology, Japan

 Abstract:
Micro Spark Coating (MSCoating) technologies which can stably build up cladding and functional coating, simultaneously, have been developed. It is an electrical discharging technique using an electrode containing either metal powder or ceramics powder, and can form high wear resistance film, efficiently. MSCoating gives the substrate less heat stress, thus build up coating without peeling. In addition this coating does not take long time due to mechanical modification. By way of example, the stellite film formed on the nickel alloy.
Substrates using this technique, which serve jet engine parts under high combustion gas demonstrates high reliability.
Titanium aluminide which is light weight material and is heat-resistant alloy comes into use as an impeller in turbocharger, as an aeration and evacuation valve in gasoline engine, and as a rotor blade in jet engine by replaced nickel alloy parts which is heavy. Titanium aluminide provides poor wear resistance, therefore it is necessary to coat the material with wear resistance building-up. But it is impossible to coat by weld surfacing because of the heat shrink crack due to lowly ductile of titanium aluminide. Now, a wear-resistant coating on titanium aluminide substrate is made by plasma spraying. But plasma spraying coating has difficulties that are easy to peel and involve an immense amount of time and effort to prepare.
We will report the MSC applicability to titanium aluminide substrate.


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