Abstract No.:
6872

 Scheduled at:
Tuesday, March 09, 2021, Hall 1 2:30 PM
Innovations with Electron Beam


 Title:
Electron beam ion sources and a novel electron beam source for enhanced additive manufacturing

 Authors:
Michael Mücke* / x, Deutschland
D. Kovalchuk / NVO Chervona Hvilya, Ukraine

 Abstract:
Electron Beam Ion Sources and a novel Electron Beam Source for enhanced Additive Manufacturing
The presentation addresses the sophisticated niche application of electron beam ion sources and a novel electron beam source for additive manufacturing.
The unique and special application for the electron beam deals with its use in an ion source for the generation of highly charged ions. Highest ionic charge states are generated by multi-electron ion collisions in dense electron beams. The principles of those sources are shown and an overview about applications in industry and research are given. A special part of this topic deals with the effects of space charge compensation in electron beams. The space charge compensation by ions allow higher beam current densities.
The company Chervona Hvilya (Kyiv, Ukraine) invents xBeam, a novel electron beam source using advantages in mechanical flexibility of the electron beam generation for a productive additive manufacturing solution. At the point of material fusion, the electron beam forms a metal deposition by melting a wire. Interpolated substrate-, source- and wire motions define the shape of the additive component. The unique source design allows to feed the wire through the center of the electron beam generator. The possibility of coaxial wire feed is provided by a special gas-discharge electron gun, in which an electron beam is generated due to secondary electron emission from a cold cathode due to bombardment by ions. This eliminates geometrical dependencies of the deposition process caused by a non-centered wire feed. Advantages of this configurations and examples are shown.



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