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| Abstract No.: |
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Scheduled at:
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Monday, June 02, 2008, Room 08 5:00 PM
Plasma Spraying and Plasma Transferred Arc 2
New trends and modified plasma processes for the application of ceramic-based coatings
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| Title: |
Analysis of the deposition mechanism in the solution precursor plasma spraying using numerically predicted particle conditions
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| Authors: |
Yanguang Shan / School of Energy and Power Engineering, University of Shanghai for Science and Technology, China
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| Abstract: |
Solution precursor plasma spraying has been used to deposit ceramic coatings with submicron/nanocrystalline structures. Previous studies revealed that the deposition mechanism in the solution precursor plasma spraying differs from that in the conventional plasma spraying. To increase the understanding of the deposition mechanism in the solution precursor plasma spraying, a numerical model is used to predict the particle conditions on the substrate. Three types of particle conditions, melted particles, un-melted particles, and precursor droplets, are obtained. An analysis of the deposition mechanism in the solution precursor plasma spraying is performed on the basis of the numerical predictions. Experiment results from literatures are also collected to verify the numerical prediction and the analysis of the deposition mechanisms.
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